Bell Labs' nanofabrication capabilities span a wide range including nano-electronic and optic devices. We leverage the experience gained in many internal and government research programs. The NJNC facility can accommodate a range of materials from Silicon over compound semiconductors to novel material such as Graphene and Carbon nanotubes.

We offer complete nano-fabrication services from concept to realization. This includes computer-aided design of lateral structures, patterning using state-of-the-art electron beam and UV stepper lithography, plasma etching, and metallization. Devices are fabricated by experienced staff members in rapid turn-around time.

• CAD layout and pattern translation
• i-line stepper lithography (3in diameter)
• contact lithography (10mm - 3in)
• sub-10 nm electron beam lithography (10 mm - 300mm)
• Metal evaporation and sputtering (10mm-12 inch)
• Dielectric deposition (10mm - 3in)
• ICP etching (10mm - 3in)
• Backside wafer processing and facet AR coating for optical devices
• Cross-sectioning and top-down high resolution electron microscopy